Process for removing molten phosphorus pentsulfide from a reacto

Chemistry of inorganic compounds – Phosphorus or compound thereof – Sulfur containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

422129, C01B 2514

Patent

active

044735383

ABSTRACT:
The invention provides a process and an apparatus for removing molten phosphorus pentasulfide, via an overflow, from a reactor, wherein phosphorus is reacted with sulfur at temperatures higher than 300.degree. C.
To this end, the reactor is supplied with phosphorus and sulfur from dosing vessels which are given the dimensions necessary (a) to receive the quantity of phosphorus and sulfur, respectively, which are required to produce phosphorus pentasulfide with a preselected quantitative ratio of P:S, (b) to provide a total filling volume corresponding to that of a P.sub.2 S.sub.5 -receiving tank. The quantity of the phosphorus and sulfur feed materials in the respective dosing vessels is in each case fully emptied into the reactor and a corresponding quantity of molten P.sub.2 S.sub.5 is simultaneously discharged directly from the reactor, via the overflow, into the respective P.sub.2 S.sub.5 -receiving tank, whose filling volume exactly corresponds, to that of the dosing vessels.

REFERENCES:
patent: 3023086 (1962-02-01), Robota
patent: 3146069 (1964-08-01), Robota
patent: 3183062 (1965-05-01), Taylor
patent: 3342552 (1967-09-01), Niermann et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for removing molten phosphorus pentsulfide from a reacto does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for removing molten phosphorus pentsulfide from a reacto, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for removing molten phosphorus pentsulfide from a reacto will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1769276

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.