Process for removing impurities from silicon fragments

Details Process for removing impurities from silicon fragments Process for removing impurities from silicon fragments

1984-05-29

1985-06-25

Dixon, Jr., William R.

Chemistry of inorganic compounds

Silicon or compound thereof

Elemental silicon

C01B 3302

Patent

active

045253366

ABSTRACT:
A process for the removal of carbon- and iron-containing impurities from icon fragments which result when polycrystalline formed silicon bodies produced by vapor phase deposition undergo a crushing treatment. The removal is effected by several steps comprising nitrate treatment, annealing, acid and magnetic treatment, leaving the treated fragments in a state of highest purity that makes them particularly useful in the crucible-pulling process of Czochralski.

REFERENCES:
patent: 3645686 (1972-02-01), Tucker
patent: 4094731 (1978-06-01), Keyser et al.
patent: 4241037 (1980-12-01), Pelosini et al.

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