Process for removing hydrogen sulfide from gases, particularly c

Details Process for removing hydrogen sulfide from gases, particularly c Process for removing hydrogen sulfide from gases, particularly c

1983-02-04

1985-02-12

Niebling, John F.

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

Carbon dioxide or hydrogen sulfide component

423234, 423238, C01B 1716, C01B 3120

Patent

active

044990600

ABSTRACT:
Hydrogen sulfide is first removed by ammoniacal liquor from coke oven gas in the bottom part of a gas scrubber. In the top part of the scrubber, two consecutively-arranged fine scrubbing stages remove hydrogen sulfide by treating the gases, in the upper stage, with a caustic soda solution or a caustic potash solution. Beneath the upper scrubbing stage is the second fine scrubbing stage fed with a subflow of an aqueous carbonate solution collecting at the outlet of the upper fine scrubbing stage and a subflow of cooled, regenerated carbonate solution discharged from the hydrogen-sulfide/hydrogen-cyanide stripper. From the hydrogen-sulfide/hydrogen-cyanide stripper, a second subflow is admixed with coal liquor for removing fixed ammonia therefrom in a separator. The separator produces water vapor with carbon dioxide vapors that are delivered to the hydrogen-sulfide/hydrogen-cyanide stripper for regenerating the aqueous carbonate washing solution.

REFERENCES:
patent: 3789105 (1974-01-01), Tippmer et al.
patent: 4302430 (1981-11-01), Weber et al.
patent: 4342731 (1982-08-01), Ritter

Affiliated with

Also associated with

Rating

Process for removing hydrogen sulfide from gases, particularly c does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for removing hydrogen sulfide from gases, particularly c, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for removing hydrogen sulfide from gases, particularly c will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1388975