Process for removing gaseous hydrides from a solid support compr

Details Process for removing gaseous hydrides from a solid support compr Process for removing gaseous hydrides from a solid support compr

1992-07-16

1995-01-03

Straub, Gary P.

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

423230, B01D 5334

Patent

active

053784391

ABSTRACT:
The invention concerns a process for removing gaseous hydrides from a solid support of metallic oxides, which consists in causing a gas flow to circulate, at room temperature, on a solid support comprising at least copper and chromium and having a specific area lower than or equal to 100 m.sup.2 /g. This process may be used for the destruction of gaseous hydrides from the industry of semi-conductors, for example silanes, arsine, phosphine, diborane, germane, stannane, gallane, stibine, and hydrogen telluride, selenide and sulfide.

REFERENCES:
patent: 4048387 (1977-09-01), Lahme et al.
patent: 4532115 (1985-07-01), Nishino et al.
patent: 4605812 (1986-08-01), Nowack et al.
patent: 4910001 (1990-03-01), Kitahara et al.
patent: 4996030 (1991-02-01), Kitahara et al.

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