Chemistry of inorganic compounds – Sulfur or compound thereof – Elemental sulfur
Patent
1997-09-23
1999-04-27
Straub, Gary P.
Chemistry of inorganic compounds
Sulfur or compound thereof
Elemental sulfur
23293S, 95291, 95290, 4235741, C01B 1702
Patent
active
058978500
ABSTRACT:
A process for the recovery of sulfur from a hydrogen sulfide containing gas, comprising oxidizing hydrogen sulfide with oxygen, and then reacting the product gas of this oxidation further by using at least two catalytic stages. The H.sub.2 S concentration in the gas leaving the last catalytic stage is controlled to have a value ranging between 0.8 and 3% by volume by reducing the quantity of combustion or oxidation air passed to the oxidation stage and/or causing a portion of the hydrogen sulfide-containing feedstock gas to bypass the oxidation stage and to be added to the gas flowing to a catalytic stage. The gas leaving the last catalytic stage is introduced into a heat exchanger having a wall temperature below the solidification point of sulfur and above the dew point of water, wherein the sulfur deposits on the heat exchanger wall and is removed with the aid of gravity.
REFERENCES:
patent: 2876070 (1959-03-01), Roberts, Jr.
patent: 2876071 (1959-03-01), Updegraff
patent: 3551113 (1970-12-01), Cash
patent: 3838979 (1974-10-01), Sims
patent: 4391791 (1983-07-01), Palm et al.
patent: 4526590 (1985-07-01), Palm et al.
patent: 4988494 (1991-01-01), Lagas et al.
Paskall, Howard C. Sulfuacondensor Function and Problem Arears, Western Research Amsterdam 1981.
Borsboom Johannes
Lagas Jan Adolf
Comprimo B.V.
Gastec N.V.
Straub Gary P.
LandOfFree
Process for removing elemental sulfur from a gas stream does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for removing elemental sulfur from a gas stream, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for removing elemental sulfur from a gas stream will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-684583