Etching a substrate: processes – Nongaseous phase etching of substrate – Etching inorganic substrate
Reexamination Certificate
2005-07-12
2005-07-12
Hassanzadeh, P. (Department: 1763)
Etching a substrate: processes
Nongaseous phase etching of substrate
Etching inorganic substrate
C134S003000, C216S099000
Reexamination Certificate
active
06916429
ABSTRACT:
A process for removing aluminosilicate-based material (e.g., “CMAS”) from a substrate is described. The material is treated with an aqueous composition containing at least one acid having the formula HxAF6, in which A is Si, Ge, Ti, Zr, Al, and Ga; and x is 1-6. Treatment of the substrate is often carried out by immersion in an aqueous bath. The process is also very effective for removing CMAS-type material from cavities in the substrate, e.g., cooling holes in a gas turbine component. Related compositions are also described.
REFERENCES:
patent: 3514407 (1970-05-01), Missel
patent: 4277289 (1981-07-01), Lectard et al.
patent: 4713119 (1987-12-01), Earhart et al.
patent: 5464479 (1995-11-01), Kenton et al.
patent: 5660885 (1997-08-01), Hasz et al.
patent: 6238743 (2001-05-01), Brooks
patent: 6379749 (2002-04-01), Zimmerman et al.
patent: 6758914 (2004-07-01), Kool et al.
patent: 2002/0100493 (2002-08-01), Kool et al.
patent: 1162286 (2001-12-01), None
patent: 2026038 (1980-01-01), None
European Search Report—EP03 25 6567, Feb. 10, 2004.
US Patent 2,501,349, F. J. Nagel et al., “Insulation for Magnetic Material”, Mar. 21, 1950, This US Patent is Related to FR 950328.
Lawrence Bernard Kool et al., “A Method for Removing a Coating From a Substrate, and Related Compositions”, U.S. Appl. No. 09/591,531, filed Jun. 9, 2000.
Lawrence Bernard Kool et al., “Method for Processing Acid Treatment Solution, Solution Processed Thereby, and Method for Treating Articles Therewith”, U.S. Appl. No. 10/063,178, filed Mar. 28, 2002.
Ferrigno Stephen Joseph
Johnson Curtis Alan
Kool Lawrence Bernard
Rosenzweig Mark Alan
Zimmerman, Jr. Robert George
Culbert Roberts
DiConza Paul J.
Hassanzadeh P.
Powell, III William E.
LandOfFree
Process for removing aluminosilicate material from a... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for removing aluminosilicate material from a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for removing aluminosilicate material from a... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3428274