Distillation: processes – separatory – With chemical reaction – Including step of adding catalyst or reacting material
Patent
1991-12-18
1994-08-09
Manoharan, Virginia
Distillation: processes, separatory
With chemical reaction
Including step of adding catalyst or reacting material
203DIG6, 203DIG16, 204 59F, 20415811, 570177, 570178, B01D 334, C07C 1700
Patent
active
053363779
ABSTRACT:
2-Chloro-1,1-difluoroethylene (R-1122) is removed from 1,1,1,2-tetrafluoroethane (R-134a) by contacting the R-134a in the vapor phase with chlorine in the presence of ultraviolet light providing an exposure of at least about 2 watts-hour/kg.
REFERENCES:
patent: 2436135 (1948-02-01), Barrick et al.
patent: 3046304 (1962-07-01), Neville
patent: 3214478 (1965-10-01), Millan, Jr.
patent: 3444249 (1969-05-01), Regan
patent: 3554887 (1971-01-01), Feehs
patent: 3686082 (1972-08-01), Ruehlen
patent: 3819483 (1974-06-01), Fozzard
patent: 4129603 (1978-12-01), Bell
patent: 4158675 (1979-06-01), Potter
patent: 4906796 (1990-03-01), Yates
patent: 4948479 (1990-08-01), Brooks et al.
Yano et al, J. Chem. Phys. vol. 72, No. 5, Mar. 1, 1980, "Vacuum-ultraviolet (147 nm) photodecomposition of 1,1,2-trichloro-2,2-difluoroethane."
Yano et al, The Journal of Physical Chemistry, vol. 83, No. 20, 1979, pp. 2572-2577 "Photodecomposition of 1,1-Difluoroethane at 147 nm."
Gordon A. J. and R. A. Ford, The Chemists Companion, Wiley Interscience (1972), pp. 362-368.
Harnish Daniel F.
Smith Addison M.
Yates Stephen F.
Allied-Signal Inc.
Boldingh Mary Jo
Friedenson Jay P.
Manoharan Virginia
Wells Harold N.
LandOfFree
Process for removing 2-chloro-1,1-difluoroethylene from 1,1,1,2- does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for removing 2-chloro-1,1-difluoroethylene from 1,1,1,2-, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for removing 2-chloro-1,1-difluoroethylene from 1,1,1,2- will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-213960