Process for removal of sulfur compounds from gases

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Carbon dioxide or hydrogen sulfide component

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423231, 423244, B01D 5334

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active

044788002

ABSTRACT:
Process for removal of sulfur compounds from gases by passing the gases over an absorption mass which, on an inert support having a specific surface area of more than 10 m.sup.2 per g, contains metal oxides which react with hydrogen sulfide to give metal-sulfur compounds and at least 20% by weight of which metal oxides are present in finely divided form with a particle size of less than 40 nm. The gases are passed at a temperature of 5.degree. to 800.degree. C. over the support loaded with metal oxide, and the resultant support loaded with metal-sulfur compounds is regenerated by passing gases containing oxidizing agents over it.

REFERENCES:
patent: 2777823 (1957-01-01), Rottig
patent: 3404099 (1968-10-01), Steinmetz
patent: 3579293 (1971-05-01), Shulz et al.
patent: 3840479 (1968-10-01), Geus
patent: 4088736 (1978-05-01), Courty et al.
patent: 4155990 (1979-05-01), Kimura et al.
patent: 4190560 (1980-02-01), Geus et al.
Langenbeck et al., "Uber einen hochaktiven Nickel-Hydmerkontaki", Naturwissenschaften, 41 (1954), p. 332.
Langenbeck et al., "Uber Mischoxalat-Kontakte", Zeitschr. anorg. allgem. Chem., 281 (1955), pp. 90-98.

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