Process for removal of pollutants

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C423S219000, C423S220000, C423S239100, C423S24000R, C423S242100, C423S243080, C423S395000, C423S430000, C423S481000, C423S497000, C423S498000, C423S554000, C423S566100, C095S045000, C095S047000, C095S052000, C095S054000

Reexamination Certificate

active

11260495

ABSTRACT:
A process for the removal of pollutants from a combustion process and, more particularly, a process for removing pollutants such as carbon dioxide, mercury, sulphur dioxide, nitrogen compounds and oxygen compounds from a combustion process. The process includes the removal of pollutants from a combustion process that produces an emission comprising: cooling the emission to a temperature of about 200° C.; removing nitrogen, water and oxygen from the emission to produce a gas containing a concentration of pollutants; contacting the gas with an aqueous magnesium chloride solution, wherein a slurry mixture is formed; and cooling the gas and the slurry mixture, wherein hydrochloric acid vapour and a sludge are formed.

REFERENCES:
patent: 4362709 (1982-12-01), Grohmann et al.
patent: 4874591 (1989-10-01), Jeney
patent: 5439658 (1995-08-01), Johnson et al.
patent: 5560894 (1996-10-01), Ueno et al.
patent: 5888465 (1999-03-01), Rappold et al.
patent: 6281164 (2001-08-01), Demmel et al.
patent: 6379638 (2002-04-01), Matacotta et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for removal of pollutants does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for removal of pollutants, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for removal of pollutants will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3905617

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.