Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture
Reexamination Certificate
2008-05-13
2008-05-13
Vanoy, Timothy C. (Department: 1793)
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
C423S219000, C423S220000, C423S239100, C423S24000R, C423S242100, C423S243080, C423S395000, C423S430000, C423S481000, C423S497000, C423S498000, C423S554000, C423S566100, C095S045000, C095S047000, C095S052000, C095S054000
Reexamination Certificate
active
07371357
ABSTRACT:
A process for the removal of pollutants from a combustion process and, more particularly, a process for removing pollutants such as carbon dioxide, mercury, sulphur dioxide, nitrogen compounds and oxygen compounds from a combustion process. The process includes the removal of pollutants from a combustion process that produces an emission comprising: cooling the emission to a temperature of about 200° C.; removing nitrogen, water and oxygen from the emission to produce a gas containing a concentration of pollutants; contacting the gas with an aqueous magnesium chloride solution, wherein a slurry mixture is formed; and cooling the gas and the slurry mixture, wherein hydrochloric acid vapour and a sludge are formed.
REFERENCES:
patent: 4362709 (1982-12-01), Grohmann et al.
patent: 4874591 (1989-10-01), Jeney
patent: 5439658 (1995-08-01), Johnson et al.
patent: 5560894 (1996-10-01), Ueno et al.
patent: 5888465 (1999-03-01), Rappold et al.
patent: 6281164 (2001-08-01), Demmel et al.
patent: 6379638 (2002-04-01), Matacotta et al.
Magumbe Lionel
Scott Douglas S.
Arent & Fox LLP
Clean World Strategies Corp.
Vanoy Timothy C.
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