Process for removal of H2S from gas processing streams

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Carbon dioxide or hydrogen sulfide component

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423229, 423 37, 4232427, 423225, B01D 5348, B01D 5352

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057004382

ABSTRACT:
A process for removing H2S and mercaptans from gas streams. The process comprises contacting such gas streams with an aqueous solution of copper complex of a water soluble amine to form water insoluble copper sulfide and regenerate free water soluble amine. The copper sulfide is removed from the system and recovered. Lastly, additional copper complex of the water soluble amine is formed by reacting the regenerated water soluble amine with a copper compound.

REFERENCES:
patent: 1989004 (1935-01-01), Fife et al.
patent: 4071470 (1978-01-01), Davidson et al.
patent: 4143119 (1979-03-01), Asperger et al.
patent: 4192854 (1980-03-01), Harvey et al.
patent: 4370306 (1983-01-01), Kirchner et al.
patent: 4435371 (1984-03-01), Frech et al.
patent: 5147620 (1992-09-01), Rozsa
patent: 5462721 (1995-10-01), Pounds et al.
Hydrocarbon Gas Processing, Chem. Eng. Sep. 1991 pp. 41-47.
Research Needs for Acid Gas Kinetics and Equilibria in Alkanolamine Systems, G. T. Rochelle; 70th An. Assoc. Convention, Mar. 1-12, 1991, San Antonio, TX.

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