Process for rejuvenation treatment of photoresist development wa

Radiation imagery chemistry: process – composition – or product th – Regenerating image processing composition – Developer

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430398, G03C 531

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active

058742042

ABSTRACT:
The disclosed process for rejuvenation treatment of a photoresist development waste mainly containing a photoresist and tetraalkylammonium (TAA) ions comprises at least the step of concentration of TAA ions by electrodialysis and/or electrolysis, and the step of removal of impurities such as Na.sup.+, etc.! by adsorption thereof on an ion exchange resin (preferably an anion exchange resin and/or a cation exchange resin in at least one of the hydrogen ion form and the TAA ion form) through contact therebetween, whereby a high-purity solution of a tetraalkylammonium hydroxide reutilizable as a photoresist developer can be simply and efficiently regenerated and recovered from the photoresist development waste. The step of concentration by evaporation and/or reverse osmosis membrane treatment may desirably be taken at least before electrodialysis and/or electrolysis from the standpoint of treatment cost reduction.

REFERENCES:
patent: 4186007 (1980-01-01), Meckl et al.
Derwent abstract of 57-155390, Week 198244 B, 1997.
Derwent abstract of 7-328642, Week 199608 B, 1997.

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