Hazardous or toxic waste destruction or containment – Containment
Patent
1997-06-03
1999-05-18
Straub, Gary P.
Hazardous or toxic waste destruction or containment
Containment
588248, 423336, 423488, 210710, 210749, 210751, A61B1/00
Patent
active
059051833
ABSTRACT:
The instant invention provides a process for reducing chloride content from by-products generated during production of methylchlorosilanes, comprising, (a) hydrolyzing the by-products by combining the by-products with an aqueous medium, the aqueous medium optionally comprising a surfactant, at a pH of at least about 7 and at a temperature above about 0.degree. C. to yield a first phase comprising essentially solids and a second phase comprising an aqueous phase; (b) separating the first and second phase; and (c) oxidizing the solids from the first phase at a temperature of at least about 300.degree. C. for up to about 24 hours to yield a residue comprising less than about 1% by weight of chloride. The solids from the first phase may alternatively be reduced under a hydrogen flow, at a temperature of at least about 500.degree. C. for up to about 24 hours.
REFERENCES:
patent: 2380995 (1945-08-01), Rechew
patent: 4221691 (1980-09-01), Danielson et al.
patent: 4393229 (1983-07-01), Ritzer et al.
patent: 4408030 (1983-10-01), Marko
patent: 4690810 (1987-09-01), Breneman et al.
patent: 4758352 (1988-07-01), Feldner et al.
patent: 4960523 (1990-10-01), Degen et al.
patent: 5066472 (1991-11-01), Ruff et al.
patent: 5175329 (1992-12-01), Bokerman et al.
patent: 5182095 (1993-01-01), Ruff et al.
patent: 5246682 (1993-09-01), Ruff et al.
patent: 5252307 (1993-10-01), Ruff
patent: 5288892 (1994-02-01), Pachaly et al.
patent: 5292909 (1994-03-01), Chadwick et al.
patent: 5326896 (1994-07-01), Chadwick et al.
patent: 5374310 (1994-12-01), Bunce et al.
Laroze & Gilbert, Silicone for the Chemical Industry III, (1996), "New Catalytic Process for the Cleavage of Disilanes".
Butts Matthew David
DeMoulpied David Cheney
White Michael Lee
General Electric Company
Johnson Noreen C.
Nguyen Cam N.
Stoner Douglas E.
Straub Gary P.
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