Chemistry of inorganic compounds – Sulfur or compound thereof – Elemental sulfur
Patent
1990-07-02
1991-10-15
Russel, Jeffrey E.
Chemistry of inorganic compounds
Sulfur or compound thereof
Elemental sulfur
423222, C01B 1705
Patent
active
050572989
ABSTRACT:
The invention is a process wherein SO.sub.2 is absorbed in a concentrated solution of potassium citrate and the solution is reacted with H.sub.2 S at a temperature above the melting point of sulfur to form elemental sulfur. The reaction produces a solution lean in sulfur dioxide. SO.sub.2, in the form of a rich solution or a gas, can be introduced into the lean solution in order to inhibit post-formation of sulfur. This introduction of SO.sub.2 avoids a tendency for sulfur to form continually after the solution exits the reaction zone.
REFERENCES:
patent: 1925198 (1933-09-01), Melvill
patent: 2031802 (1936-02-01), Tyrer
patent: 2729543 (1956-01-01), Keller
patent: 3833508 (1974-09-01), Austin et al.
patent: 3911093 (1975-10-01), Sherif et al.
patent: 3933994 (1976-01-01), Rounds
patent: 3983225 (1976-09-01), Van Brocklin et al.
patent: 4366134 (1982-12-01), Korosy et al.
patent: 4442083 (1984-04-01), Canales et al.
patent: 4450145 (1984-05-01), Klepeis
patent: 4519994 (1985-05-01), Smalheiser
patent: 4634582 (1987-01-01), Sliger et al.
Sulfur Removal By An Aqueous Process, M. J. Canales, Mar., 1985 pp. 1-15.
Chemistry of SO.sub.2 Absorption and Conversion to Sulfur by the Citrate Process, Korosy, et al., Apr., 1974 (17 total pp.).
Arbo John C.
Gryka George E.
Ray William G.
Ortiz Daniel S.
Pipco, Inc.
Russel Jeffrey E.
LandOfFree
Process for recovery of sulfur values from a gas stream does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for recovery of sulfur values from a gas stream, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for recovery of sulfur values from a gas stream will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-989580