Process for recovery of high purity silicon

Details Process for recovery of high purity silicon Process for recovery of high purity silicon

1982-02-12

1983-06-14

Garris, Bradley

Chemistry: physical processes

Physical processes

134 2, 156DIG64, 423348, B01D 2101, G01B 3302

Patent

active

043880800

ABSTRACT:
A method of recovering silicon from an aqueous slurry containing finely divided silicon particles comprising mixing at least one flocculating agent with the slurry, allowing silicon flocs to form and physically separating the silicon flocs from the slurry for re-use of the silicon contained therein.

REFERENCES:
patent: 3257081 (1966-06-01), Brown et al.
patent: 4129457 (1978-12-01), Basi
patent: 4256571 (1981-03-01), Somasundaran et al.
Meek et al., "Silicon Surface Contamination: Polishing and Cleaning", J. Electrochem. Soc., vol. 120, No. 9, pp. 1241 and 1242, Sep. 1973.
Dessaver et al., "Recovering Semiconductor Waste Material", IBM Technical Disclosure Bulletin, vol. 10, No. 1, Jun. 1967.

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