Liquid purification or separation – Processes – Liquid/liquid solvent or colloidal extraction or diffusing...
Patent
1995-08-30
1996-05-28
Nessler, Cynthia L.
Liquid purification or separation
Processes
Liquid/liquid solvent or colloidal extraction or diffusing...
210639, 423 34, C02F 126, C02F 128
Patent
active
055208142
ABSTRACT:
A process comprising spent metal etching solutions, the process comprising the steps of: 1) extracting the metal ions from the spent etching solution by means of a liquid ion exchanger; 2) washing the liquid ion exchanger by means of water; 3) vaporizing the washing water; 4) crystallizing the concentrate after vaporization; 5) filtering the regenerated etching solution; 6) restoring the quality of the etching solution; 7) reextracting the metal from the metal-loaded ion exchanger; 8) washing the liquid ion exchanger; 9) neutralizing the washing water; 10) filtering after carrying out the neutralization; and 11) recovering metal electrolytically.
REFERENCES:
patent: 3224873 (1965-12-01), Swanson
patent: 3440036 (1969-04-01), Spinney
patent: 3761249 (1973-09-01), Ritcey et al.
patent: 4083758 (1978-03-01), Hamby et al.
patent: 4272492 (1981-06-01), Jensen
patent: 4329210 (1982-05-01), Merchant et al.
patent: 4350667 (1982-09-01), Andersson et al.
Tsukada Noriaki et al., JP-A-55 091 979 Patent Abstracts of Japan, vol. 4, No. 144 (C-27) (626) Oct. 11, 1980, Abstract.
Saburou Ikeda, JP-A-55 145 177, Patent Abstracts of Japan, vol. 5, No. 16 (C-41) (688) Jan. 30, 1981, Abstract.
In.Tec. Italia International Environment Technology S.r.l.
Nessler Cynthia L.
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