Process for recovering SF.sub.6 from a gas

Gas separation: processes – Selective diffusion of gases – Selective diffusion of gases through substantially solid...

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95 51, 95 52, 95 54, 423155, 423241, B01D 5322

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active

060961147

ABSTRACT:
A process for recovering SF.sub.6 from a gas is provided. The process includes the step of contacting a gas stream comprising SF.sub.6 and at least one of N.sub.2, O.sub.2, CO.sub.2, and H.sub.2 O with a membrane in at least one membrane separation unit at conditions effective to obtain a retentate stream rich in SF.sub.6 and a permeate stream rich in at least one of N.sub.2, O.sub.2, CO.sub.2, and H.sub.2 O. A process for forming solidified Mg metal is also provided. The process includes recovering and/or recycling of SF.sub.6 and/or CO.sub.2.

REFERENCES:
patent: 2947687 (1960-08-01), Lee
patent: 2953502 (1960-09-01), Binning et al.
patent: 2960462 (1960-11-01), Lee et al.
patent: 2970106 (1961-01-01), Binning et al.
patent: 3508994 (1970-04-01), Nyrop
patent: 3616607 (1971-11-01), Klass et al.
patent: 3648845 (1972-03-01), Riley
patent: 4086310 (1978-04-01), Bottenbruch et al.
patent: 4113628 (1978-09-01), Alegranti
patent: 4119417 (1978-10-01), Heki et al.
patent: 4132824 (1979-01-01), Kimura et al.
patent: 4155793 (1979-05-01), Salemme et al.
patent: 4156597 (1979-05-01), Browall
patent: 4192824 (1980-03-01), Robinson et al.
patent: 4378324 (1983-03-01), Makino et al.
patent: 4435191 (1984-03-01), Graham
patent: 4460526 (1984-07-01), Makino et al.
patent: 4474662 (1984-10-01), Makino et al.
patent: 4485056 (1984-11-01), Makino et al.
patent: 4512893 (1985-04-01), Makino et al.
patent: 4602922 (1986-07-01), Cabasso et al.
patent: 4664669 (1987-05-01), Ohyabu et al.
patent: 4689267 (1987-08-01), Takamizawa et al.
patent: 4701187 (1987-10-01), Choe et al.
patent: 4713292 (1987-12-01), Takemura et al.
patent: 4714481 (1987-12-01), Matsuura et al.
patent: 4717394 (1988-01-01), Hayes
patent: 4717395 (1988-01-01), Chiao
patent: 4741829 (1988-05-01), Takemura et al.
patent: 4756932 (1988-07-01), Puri
patent: 4826599 (1989-05-01), Bikson et al.
patent: 4931070 (1990-06-01), Prasad
patent: 5009869 (1991-04-01), Weinberg et al.
patent: 5085676 (1992-02-01), Ekiner et al.
patent: 5102432 (1992-04-01), Prasad
patent: 5169412 (1992-12-01), Prasad et al.
patent: 5234471 (1993-08-01), Weinberg
patent: 5248319 (1993-09-01), Ekiner et al.
patent: 5281253 (1994-01-01), Thompson
patent: 5282969 (1994-02-01), Xu
patent: 5378263 (1995-01-01), Prasad
patent: 5482539 (1996-01-01), Callahan
patent: 5503657 (1996-04-01), Bouard et al.
patent: 5730779 (1998-03-01), Chernyakov et al.
patent: 5759237 (1998-06-01), Li et al.
patent: 5814127 (1998-09-01), Li
patent: 5843208 (1998-12-01), Anumakonda et al.
patent: 5855647 (1999-01-01), Li et al.
patent: 5858065 (1999-01-01), Li et al.
patent: 5919285 (1999-07-01), Li et al.
Carson, William J.; Christian, Kimberly A.; Crossland, Eugene C.; Hsiung, Thomas H.; Ridgeway, Robert G.; and Yang, James H. "Large Scale PFC Capture System." (Air Products and Chemicals, Inc.) Presented at SEMICON Southwest, Auston, TX., Oct. 13, 1997.
Stannett, V.; and William, J.L. "The Permeability of Poly(ethyl Methacrylate) to Gases and Water Vapor." Journal of Polymer Science: Part C, No. 10, pp. 45-49, (1963).
Norton, Francis J. "Gas Permeation through Lexan Polycarbonate Resin." Journal of Applied Polymer Science, vol. 7, pp. 1649-1659, (1963).

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