Gas separation: processes – Selective diffusion of gases – Selective diffusion of gases through immobilized liquid
Patent
1994-06-02
2000-10-31
Ford, John M.
Gas separation: processes
Selective diffusion of gases
Selective diffusion of gases through immobilized liquid
95 54, 95138, 95178, 95230, 252 1, 540465, 540467, 540474, C07C22916, C07D25702
Patent
active
061396036
ABSTRACT:
Method for recovering oxygen from a medium containing O.sub.2 using polynitrogenated compounds that have five coordinating functions which are capable of binding a metal atom, particularly a cobalt atom. In the recovery method, oxygen is first absorbed by the metal complex and then desorbed from the complex and recovered in an appropriate vessel.
REFERENCES:
patent: 2751390 (1956-06-01), Bersworth
patent: 2781389 (1957-02-01), Mannheimer
patent: 4678667 (1987-07-01), Meares et al.
patent: 4702998 (1987-10-01), Tanaka et al.
patent: 4789745 (1988-12-01), Lin
patent: 4885363 (1989-12-01), Tweedle et al.
Journal of the Chemical Society, No. 6, Mar. 1984, C. Raleigh et al.: "Autoxidation pathways of Co.sup.II -complexes of pyridyl-containing pentamines involving dioxygen compleses as intermediates", pp. 335-336.
Inorganic Chemistry, vol. 14, No. 10, Oct. 1975, G. McLendon et al.: "Combination of dioxygen with N,N-bis (2-aminoethyl) glycinatocobalt (II) and with diethylenetriamine-N-acetatocobalt (II)", pp. 2322-2326.
Martin Studer et al., Helv. Chim. Acta. vol. 69, pp. 2081-2086, 1986.
Gries et al, "Chemical Abstract", 109(1), 1988 #6552X.
Boisselier-Cocolios Brigitte
Guilard Roger
Jean Christophe
Taurin Laurent
Ford John M.
L'Air Liquide Societe Anonyme pour l'Etude et, l'Exploitation de
Sripada Pavanaram K
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