Process for radiation free electron beam deposition

Details Process for radiation free electron beam deposition Process for radiation free electron beam deposition

1983-07-01

1984-09-18

Pianalto, Bernard D.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 86, B05D 306

Patent

active

044724535

ABSTRACT:
A method for the deposition of thin films on semiconductor devices is disclosed which utilizes electron-beam induced evaporation techniques. A shield device is included for preventing high energy particles, resulting from the use of the electron-beam, from reaching the semiconductor devices being coated.

REFERENCES:
patent: 3226271 (1965-12-01), Hugle et al.
patent: 3420704 (1969-01-01), Webb
patent: 3554512 (1972-01-01), Elliott et al.
patent: 3756847 (1973-09-01), Leibowitz et al.
patent: 3864162 (1975-02-01), Kenty
patent: 3996469 (1976-12-01), Janes
patent: 4184448 (1980-01-01), Aichert et al.

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