Process for purifying vinylphenol polymers for use as photoresis

Details Process for purifying vinylphenol polymers for use as photoresis Process for purifying vinylphenol polymers for use as photoresis

1992-11-23

1994-02-08

Lipman, Bernard

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Treating polymer containing material or treating a solid...

528483, 528493, 528494, 528495, 430281, C08F 608

Patent

active

052849309

ABSTRACT:
Recently, vinylphenol polymers have received special attention as materials for photoresists, since these materials have excellent transmittance of deep ultraviolet light in the neighborhood of 248 nm. Although particularly useful in this regard, vinylphenol polymers usually contain metal impurities, while photoresists must have high transmittance and extremely low metal content. As a result, vinylphenol polymers satisfying these requirements have not been available on industrial scale. In the present invention, a process for producing such purified vinylphenol polymers, both economically and easily, is realized. In the process of this invention, the vinylphenol polymer solution is hydrogenated and the hydrogenated solution is contacted with a strongly acidic cation exchange resin. In this way, substantially metal-free vinylphenol polymers are obtained.

REFERENCES:
Japanese Patent Laid-Open No. 1-132619.
Japanese Patent Laid-Open No. 1-103604--Hei 1 (1989).
Japanese Patent Laid-Open No. Sh 60 (1985) 58407.

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