Process for purifying nitrogen trifluoride gas

Details Process for purifying nitrogen trifluoride gas Process for purifying nitrogen trifluoride gas

1989-04-07

1990-08-14

Stoll, Robert L.

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

Halogenous component

422241, 423406, C01B 700, C01B 2106

Patent

active

049485717

ABSTRACT:
A process of the present invention can effectively decompose, particularly, dinitrogen difluoride present in a nitrogen trifluoride gas to remove it from the gas.
This process for purifying the nitrogen trifluoride gas is characterized by comprising the step of heating the nitrogen trifluoride gas containing at least dinitrogen difluoride as an impurity at a temperature of 150.degree. C. to 600.degree. C. in a metallic vessel the inner wall of which is lined with a solid fluoride, or in a packing layer of the solid fluoride in the vessel.

REFERENCES:
patent: 4156598 (1979-05-01), Woytek et al.
patent: 4193976 (1980-03-01), Lileck et al.
patent: 4399113 (1983-08-01), Tosaka et al.
Massonne, J., Chem. Ing. Techn., 41, 12, (1969), p. 695.
Chem. Eng., 84, (1977), p. 116.

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