Chemistry of inorganic compounds – Halogen or compound thereof – Hydrogen halide
Patent
1991-02-22
1992-03-31
Niebling, John
Chemistry of inorganic compounds
Halogen or compound thereof
Hydrogen halide
204101, 204128, 204186, 210748, 210758, C01B 719, C02F 172, C25B 124
Patent
active
051006391
ABSTRACT:
A process for manufacturing high purity anhydrous hydrogen fluoride (HF) having low levels of oxidizable impurities by electrolytically oxidizing the impurities. Specifically, trivalent arsenic impurity in the anhydrous hydrogen fluoride is oxidized to a non-volatile pentavalent arsenic compound. The resultant mixture is distilled to recover high purity anhydrous hydrogen fluoride with low levels of arsenic impurity.
REFERENCES:
patent: 2742415 (1956-04-01), Lawrence et al.
patent: 2767136 (1956-10-01), Rodis et al.
patent: 4692228 (1987-09-01), Taardowski
Barker Craig T.
Edwards Eileen G.
Freire Francisco J.
Howell Jon L.
Motz Kaye L.
Bolam Brian M.
Boyer Michael K.
E. I. Du Pont de Nemours and Company
Niebling John
Stevenson Robert B.
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