Process for purifying high-temperature reducing gases

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Carbon dioxide or hydrogen sulfide component

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

423230, 42324406, B01D 5348, B01D 5352, C10K 126, C10K 128

Patent

active

054277523

ABSTRACT:
A process for purifying high-temperature reducing gases containing sulfureous contaminants including hydrogen sulfide and carbonyl sulfide with an absorbent, said process characterized in that at least three reactor towers which are filled with an absorbent are used, and said process comprises the three steps of absorption, regeneration, and reduction, and during in a part of operation two reactor towers are connected in series so as to carry out regeneration, and O.sub.2 concentration can be controlled separately for each regenerating reactor tower in the regeneration step, and steam can be supplied so as to prevent excessive reduction of the absorbent from occurring in the reduction step. The life of the absorbent can be extended and operational costs may be reduced.

REFERENCES:
patent: 4609541 (1986-09-01), Calderon
patent: 4857285 (1989-08-01), Gal

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for purifying high-temperature reducing gases does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for purifying high-temperature reducing gases, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for purifying high-temperature reducing gases will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-285320

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.