Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Halogenous component
Patent
1995-08-23
1996-12-31
Nguyen, Ngoc-Yen
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
Halogenous component
423500, C01B 707
Patent
active
055891489
ABSTRACT:
There is disclosed a process for purifying a halogen-containing gas (halogen gas such as chlorine, fluorine alone or diluted with an inert gas) which comprises bringing the halogen-containing gas into contact with a purifying agent comprising a hydroxide of an alkaline earth metal such as strontium hydroxide and an iron oxide such as triiron tetraoxide to efficiently remove hydrogen halogenides such as hydrogen chloride and hydrogen fluoride along with moisture that are contained as impurities in the halogen-containing gas. The above process enables the formation of a non-corrosive halogen-containing gas having an extremely high purity and capable of being favorably used as etching gas for silicon films, aluminum alloy films, etc. in a semiconductor manufacturing process.
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Derwent Publications Ltd., Database WPI, 24 Oct. 1995, Section Ch, Week 9551, Class E31, AN 95-399638 of JP-A-07 275 664 (Nippon Pionics Co. Ltd.), London, GB,.
Arakawa Satoshi
Fukuda Hideki
Otsuka Kenji
Japan Pionics Co., Ltd.
Nguyen Ngoc-Yen
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