Process for purifying aluminum chloride

Chemistry of inorganic compounds – Treating mixture to obtain metal containing compound – Group iiia metal or beryllium

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

423135, 423240, 423495, C01F 762

Patent

active

049005219

ABSTRACT:
A process for purifying anhydrous aluminum chloride containing organochlorine impurities, comprising contacting said impure aluminum chloride with a bath containing at least one chloroaluminate for a time sufficient to remove said impurities therefrom and recovering the purified aluminum chloride in the vapor phase of the chloroaluminate bath.

REFERENCES:
patent: 1269236 (1918-06-01), Weaver
patent: 1426081 (1922-08-01), Hoover
patent: 1903486 (1933-03-01), Wurster et al.
patent: 2945911 (1960-07-01), Murray
patent: 3336731 (1967-08-01), Phillips et al.
patent: 3627483 (1970-02-01), Cole et al.
patent: 3832452 (1974-08-01), Crouch, Jr.
patent: 4017584 (1977-04-01), Messina et al.
patent: 4035169 (1977-07-01), Sebenik et al.
patent: 4469661 (1984-09-01), Schultz
patent: 4541907 (1985-09-01), Culleiton et al.
"Soviet Inventions Illustrated", 214526, Nov., 1968 (Derwent Publications Ltd., RochDale House, Theobalds Rd., London, W.C.I.).
Ota et al., "Decomposition of Polychlorobiphenyl into Carbon and Hydrogen Chloride by Using Molten Salt", Nippon Kagakukaishi 1977 (9), pp. 1407 to 1409.
"Industrial Inorganics", vol. 96, 1982, p. 153, 96:54731q.
"Chemical Abstract", vol. 69, 1968, No. 12, 44947t.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for purifying aluminum chloride does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for purifying aluminum chloride, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for purifying aluminum chloride will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1166513

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.