Process for purification of gaseous organometallic compound

Details Process for purification of gaseous organometallic compound Process for purification of gaseous organometallic compound

1994-02-23

1995-11-28

Lander, Ferris

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

Molecular oxygen or ozone component

423210, 556 1, 260665R, B01D 5346, C07F 1900, C23C 1616, C23C 1618

Patent

active

054705550

ABSTRACT:
There is disclosed a process for purification a gaseous organometallic compound containing impurities by bringing the compound into contact with a catalyst comprising a copper or nickel component as the essential ingredient to remove oxygen contained in the compound. The above-mentioned process is capable removal of oxygen in an organometallic compound as low as 0.1 ppm and further to a ultralow concentration of 0.01 ppm, which removal has heretofore been impossible, and thereby the production of a ultrapure organometallic compound has been made possible.

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Patent Abstracts of Japan, vol. 15, No. 128 (C-818)(4656) Mar. 28, 1991 of JP-A-30 12 303, (Japan Pionics) Jan. 21, 1991.

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