Process for protection of the surface of a fixed contact for...

Details Process for protection of the surface of a fixed contact for... Process for protection of the surface of a fixed contact for...

2005-10-04

2005-10-04

Pert, Evan (Department: 2826)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

Reexamination Certificate

active

06951772

ABSTRACT:
The invention relates to a process for making a semiconductor color image sensor cell comprising a metal layer in which a fixed contact is defined, an anti-reflecting layer covering the metal layer and a passivation layer covering the assembly. The method includes etching the passivation layer and stopping on the anti-reflecting layer so as to form a hole for the opening of the fixed contact; forming at least one colored filter element on a region of the passivation layer, the anti-reflecting layer then acting as a protection layer for the surface of the fixed contact; depositing a planarizing resin layer so as to cover the colored filter elements; forming micro-lenses on the planarizing resin layer above the colored filter elements; and etching the anti-reflecting layer to open the fixed contact.

REFERENCES:
patent: 5854091 (1998-12-01), Back et al.
patent: 6396089 (2002-05-01), Lin et al.
French Preliminary Search Report dated Aug. 27, 2003 for French Application No. 0216118.

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