Process for production of tris(nonylphenyl) phosphite

Organic compounds -- part of the class 532-570 series – Organic compounds – Phosphorus esters

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

558 90, C07F 908

Patent

active

055324010

ABSTRACT:
An improved process for the preparation of tris(nonylphenyl) phosphite is described which includes the steps of combining at least a 4 weight percent excess of nonylphenol (preferably 8 weight percent excess) with PCl.sub.3 with agitation and heating sufficient to liberate HCl formed during the synthetic reaction as a by-product and removing the excess nonylphenol from the tris(nonylphenyl) phosphite by thin film distillation to reduce the residual chloride level to 90 ppm or less, an acid number of 0.1 or less and a nonylphenol content after stripping of 0.1 weight percent or less. The temperature of the reaction was from room temperature to 130.degree. C., and the temperature of the evaporator which removes the excess nonylphenol is from 100.degree. C. to 350.degree. C., preferably from 150.degree. C. to 250.degree. C., under a system vacuum of from 0.01 mm Hg to 5 mm Hg.

REFERENCES:
patent: 3351683 (1967-11-01), Wu et al.
patent: 3823207 (1974-07-01), Herzog et al.
patent: 4086304 (1978-04-01), Hutton et al.
patent: 5298541 (1994-03-01), Bohshar et al.
patent: 5322871 (1994-06-01), Pitteloud et al.
patent: 5401845 (1995-03-01), Pitteloud et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for production of tris(nonylphenyl) phosphite does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for production of tris(nonylphenyl) phosphite, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for production of tris(nonylphenyl) phosphite will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1507681

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.