Process for production of SOI substrate and process for...

Details Process for production of SOI substrate and process for... Process for production of SOI substrate and process for...

2008-07-10

2010-10-05

Brewster, William M. (Department: 2823)

Semiconductor device manufacturing: process

Packaging or treatment of packaged semiconductor

Assembly of plural semiconductive substrates each possessing...

C438S406000, C438S422000, C438S455000, C438S459000, C438S460000

Reexamination Certificate

active

07807500

ABSTRACT:
A process for producing an adhered SOI substrate without causing cracking and peeling of a single-crystal silicon thin film. The process consists of selectively forming a porous silicon layer in a single-crystal semiconductor substrate, adding hydrogen into the single-crystal semiconductor substrate to form a hydrogen-added layer, adhering the single-crystal semiconductor substrate to a supporting substrate, separating the single-crystal semiconductor substrate at the hydrogen-added layer by thermal annealing, performing thermal annealing again to stabilize the adhering interface, and selectively removing the porous silicon layer to give single-crystal silicon layer divided into islands.

REFERENCES:
patent: 3964941 (1976-06-01), Wang
patent: 4217153 (1980-08-01), Fukunaga et al.
patent: 4583122 (1986-04-01), Ohwada et al.
patent: 4665419 (1987-05-01), Sasaki
patent: 4733947 (1988-03-01), Ota et al.
patent: 4753896 (1988-06-01), Matloubian
patent: 4768076 (1988-08-01), Aoki et al.
patent: 4786955 (1988-11-01), Plus et al.
patent: 4822752 (1989-04-01), Sugahara et al.
patent: 4857986 (1989-08-01), Kinugawa
patent: 4899202 (1990-02-01), Blake et al.
patent: 4933298 (1990-06-01), Hasegawa
patent: 4943837 (1990-07-01), Konishi et al.
patent: 5002630 (1991-03-01), Kermani et al.
patent: 5059304 (1991-10-01), Field
patent: 5130770 (1992-07-01), Blanc et al.
patent: 5215931 (1993-06-01), Houston
patent: 5243213 (1993-09-01), Miyazawa et al.
patent: 5258323 (1993-11-01), Sarma et al.
patent: 5261999 (1993-11-01), Pinker et al.
patent: 5317236 (1994-05-01), Zavracky et al.
patent: 5317433 (1994-05-01), Miyawaki et al.
patent: 5341028 (1994-08-01), Yamaguchi et al.
patent: 5371037 (1994-12-01), Yonehara
patent: 5374564 (1994-12-01), Bruel
patent: 5387555 (1995-02-01), Linn et al.
patent: 5403759 (1995-04-01), Havemann
patent: 5407837 (1995-04-01), Eklund
patent: 5424230 (1995-06-01), Wakai
patent: 5426062 (1995-06-01), Hwang
patent: 5444282 (1995-08-01), Yamaguchi et al.
patent: 5508209 (1996-04-01), Zhang et al.
patent: 5550070 (1996-08-01), Funai et al.
patent: 5569620 (1996-10-01), Linn et al.
patent: 5573961 (1996-11-01), Hsu et al.
patent: 5574292 (1996-11-01), Takahashi et al.
patent: 5576556 (1996-11-01), Takemura et al.
patent: 5581092 (1996-12-01), Takemura
patent: 5612230 (1997-03-01), Yuzurihara et al.
patent: 5633182 (1997-05-01), Miyawaki et al.
patent: 5640033 (1997-06-01), Matsuoka
patent: 5643826 (1997-07-01), Ohtani et al.
patent: 5648277 (1997-07-01), Zhang et al.
patent: 5693959 (1997-12-01), Inoue et al.
patent: 5695557 (1997-12-01), Yamagata et al.
patent: 5698869 (1997-12-01), Yoshimi et al.
patent: 5710057 (1998-01-01), Kenney
patent: 5714395 (1998-02-01), Bruel
patent: 5719065 (1998-02-01), Takemura et al.
patent: 5750000 (1998-05-01), Yonehara et al.
patent: 5767529 (1998-06-01), Kobori et al.
patent: 5778237 (1998-07-01), Yamamoto et al.
patent: 5784132 (1998-07-01), Hashimoto
patent: 5793073 (1998-08-01), Kaminishi et al.
patent: 5818076 (1998-10-01), Zhang et al.
patent: 5821138 (1998-10-01), Yamazaki et al.
patent: 5837569 (1998-11-01), Makita et al.
patent: 5840616 (1998-11-01), Sakaguchi et al.
patent: 5841173 (1998-11-01), Yamashita
patent: 5849627 (1998-12-01), Linn et al.
patent: 5854123 (1998-12-01), Sato et al.
patent: 5854509 (1998-12-01), Kunikiyo
patent: 5856229 (1999-01-01), Sakaguchi et al.
patent: 5869387 (1999-02-01), Sato et al.
patent: 5877070 (1999-03-01), Goesele et al.
patent: 5882987 (1999-03-01), Srikrishnan
patent: 5886385 (1999-03-01), Arisumi et al.
patent: 5893730 (1999-04-01), Yamazaki et al.
patent: 5899711 (1999-05-01), Smith
patent: 5904528 (1999-05-01), Lin et al.
patent: 5913111 (1999-06-01), Kataoka et al.
patent: 5923962 (1999-07-01), Ohtani et al.
patent: 5926430 (1999-07-01), Noda et al.
patent: 5929527 (1999-07-01), Yamazaki et al.
patent: 5943105 (1999-08-01), Fujikawa et al.
patent: 5949107 (1999-09-01), Zhang
patent: 5953622 (1999-09-01), Lee et al.
patent: 5962897 (1999-10-01), Takemura et al.
patent: 5965918 (1999-10-01), Ono
patent: 5966594 (1999-10-01), Adachi et al.
patent: 5966620 (1999-10-01), Sakaguchi et al.
patent: 5980633 (1999-11-01), Yamagata et al.
patent: 5982002 (1999-11-01), Takasu et al.
patent: 5985681 (1999-11-01), Hamajima et al.
patent: 5985740 (1999-11-01), Yamazaki et al.
patent: 6020252 (2000-02-01), Aspar et al.
patent: 6027988 (2000-02-01), Cheung et al.
patent: 6031249 (2000-02-01), Yamazaki et al.
patent: 6044474 (2000-03-01), Klein
patent: 6049092 (2000-04-01), Konuma et al.
patent: 6051453 (2000-04-01), Takemura
patent: 6054363 (2000-04-01), Sakaguchi et al.
patent: 6063706 (2000-05-01), Wu
patent: 6077731 (2000-06-01), Yamazaki et al.
patent: 6093937 (2000-07-01), Yamazaki et al.
patent: 6096582 (2000-08-01), Inoue et al.
patent: 6107639 (2000-08-01), Yamazaki et al.
patent: 6107654 (2000-08-01), Yamazaki
patent: 6118148 (2000-09-01), Yamazaki
patent: 6121117 (2000-09-01), Sato et al.
patent: 6124613 (2000-09-01), Kokubun
patent: 6127702 (2000-10-01), Yamazaki et al.
patent: 6133073 (2000-10-01), Yamazaki et al.
patent: 6140667 (2000-10-01), Yamazaki et al.
patent: 6157421 (2000-12-01), Ishii
patent: 6165880 (2000-12-01), Yaung et al.
patent: 6171982 (2001-01-01), Sato
patent: 6184556 (2001-02-01), Yamazaki et al.
patent: 6191007 (2001-02-01), Matsui et al.
patent: 6191476 (2001-02-01), Takahashi et al.
patent: 6207969 (2001-03-01), Yamazaki
patent: 6211041 (2001-04-01), Ogura
patent: 6218678 (2001-04-01), Zhang et al.
patent: 6246068 (2001-06-01), Sato et al.
patent: 6262438 (2001-07-01), Yamazaki et al.
patent: 6268842 (2001-07-01), Yamazaki et al.
patent: 6271101 (2001-08-01), Fukunaga
patent: 6287900 (2001-09-01), Yamazaki et al.
patent: 6291275 (2001-09-01), Yamazaki et al.
patent: 6294478 (2001-09-01), Sakaguchi et al.
patent: 6307220 (2001-10-01), Yamazaki
patent: 6326249 (2001-12-01), Yamazaki et al.
patent: 6331208 (2001-12-01), Nishida et al.
patent: 6335231 (2002-01-01), Yamazaki et al.
patent: 6335716 (2002-01-01), Yamazaki et al.
patent: 6342433 (2002-01-01), Ohmi et al.
patent: 6350702 (2002-02-01), Sakaguchi et al.
patent: 6365933 (2002-04-01), Yamazaki et al.
patent: 6369410 (2002-04-01), Yamazaki et al.
patent: 6380046 (2002-04-01), Yamazaki
patent: 6380560 (2002-04-01), Yamazaki et al.
patent: 6388291 (2002-05-01), Zhang et al.
patent: 6388652 (2002-05-01), Yamazaki et al.
patent: 6420759 (2002-07-01), Yamazaki et al.
patent: 6421754 (2002-07-01), Kau et al.
patent: 6424011 (2002-07-01), Assaderaghi et al.
patent: 6433361 (2002-08-01), Zhang et al.
patent: 6452211 (2002-09-01), Ohtani et al.
patent: 6455401 (2002-09-01), Zhang et al.
patent: 6458637 (2002-10-01), Yamazaki et al.
patent: 6465287 (2002-10-01), Yamazaki et al.
patent: 6528820 (2003-03-01), Yamazaki et al.
patent: 6549184 (2003-04-01), Koyama et al.
patent: 6583474 (2003-06-01), Yamazaki et al.
patent: 6590230 (2003-07-01), Yamazaki et al.
patent: 6602761 (2003-08-01), Fukunaga
patent: 6617612 (2003-09-01), Zhang et al.
patent: 6667494 (2003-12-01), Yamazaki et al.
patent: 6686623 (2004-02-01), Yamazaki
patent: 6730932 (2004-05-01), Yamazaki et al.
patent: 6787806 (2004-09-01), Yamazaki et al.
patent: 6803264 (2004-10-01), Yamazaki et al.
patent: 6808965 (2004-10-01), Miyasaka et al.
patent: 6844628 (2005-01-01), Yamazaki et al.
patent: 6849872 (2005-02-01), Yamazaki et al.
patent: 6867431 (2005-03-01), Konuma et al.
patent: 6875633 (2005-04-01), Fukunaga
patent: 6882018 (2005-04-01), Ohtani et al.
patent: 6940094 (2005-09-01), Yamazaki et al.
patent: 6979882 (2005-12-01), Yamazaki et al.
patent: 7023052 (2006-04-01), Yamazaki et al.
patent: 7138658 (2006-11-01), Yamazaki et al.
patent: 7148119 (2006-12-01), Sakaguchi et al.
patent: RE39484 (2007-02-01), Bruel
patent: 7172929 (2007-02-01), Yamazaki et al.
patent: 7176525 (2007-02-01), Fukunaga
patent: 7199024 (2007-04-01), Yamazaki
patent: 7223666 (2007-05-01), Ohtani et al.
patent: 7298021 (2007-11-01), Yamazaki et al.
patent: 7381599 (2008-06-01), Konuma et al.
patent: 7446392 (2008-11-01), Yamazaki et al.
patent: 7473592 (2009-01-01), Yamazaki et al.
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