Chemistry of inorganic compounds – Carbon or compound thereof – Elemental carbon
Reexamination Certificate
2008-05-28
2010-02-02
Hendrickson, Stuart (Department: 1793)
Chemistry of inorganic compounds
Carbon or compound thereof
Elemental carbon
C423S450000
Reexamination Certificate
active
07655209
ABSTRACT:
Off-gas from a carbon black furnace is employed as a combustion gas feed stream to the burner or combustion zone of the same or a different carbon black furnace in accordance with certain embodiments, suitable conduit and valving is provided to pass off-gas, from which carbon black has been substantially removed, from any and all of multiple different carbon black furnaces to the burner. The off-gas is heated, preferably by plasma heating, and dewatered. Carbon dioxide stripping or rather stripping of gas components from the dewatered heated off-gas is found to be unnecessary to achieve economically favorable use of off-gas recirculation.
REFERENCES:
patent: 2564736 (1951-08-01), Stokes
patent: 2672402 (1954-03-01), Stokes
patent: 2796332 (1957-06-01), Pollock
patent: 3438732 (1969-04-01), Morel
patent: 3645685 (1972-02-01), Crouch
patent: 4101639 (1978-07-01), Surovikin et al.
patent: 4315894 (1982-02-01), Austin
patent: 4393034 (1983-07-01), Smith
patent: 4636375 (1987-01-01), Rothbühr et al.
patent: 4690695 (1987-09-01), Doshi
patent: 5240472 (1993-08-01), Sircar
patent: 5486674 (1996-01-01), Lynum et al.
patent: 5527518 (1996-06-01), Lynum et al.
patent: 5725616 (1998-03-01), Lynum et al.
patent: 7431909 (2008-10-01), Rumpf et al.
Rumpf Frederick H.
Taylor Roscoe W.
Toombs Alvin E.
Cabot Corporation
Hendrickson Stuart
LandOfFree
Process for production of carbon black does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for production of carbon black, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for production of carbon black will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4216606