Process for production of carbon black

Details Process for production of carbon black Process for production of carbon black

1976-06-23

1978-07-18

Thomas, Earl C.

Chemistry of inorganic compounds

Carbon or compound thereof

Elemental carbon

423450, 423456, 232595, C01B 3102, C09C 148

Patent

active

041016394

ABSTRACT:
Water vapor is injected into a gaseous heat carrier passing into a reaction chamber as a plasma stream, contacting a hydrocarbon feed stock there is injected water vapor, and introduced presaturated with water vapor. Under the effect of the heat carrier temperature, the feedstock is decomposed to carbon black which, after being quenched, is collected, for example, by cyclones.
The proposed process makes it possible to decrease the degree of polydispersion of the carbon black obtained and also to produce carbon black with a specific geometrical surface within the range of from 50 m.sup.2 /g to 250 m.sup.2 /g, without altering the construction of the reaction chamber.
The proposed process avoids the formation of laminated structures, pyrolytic carbon and graphite in the carbon black, which improves the quality of rubber based on these carbon blacks insofar as their abrasive resistance and tensile strength are concerned. Besides, the proces makes it possible to conduct the carbon black-forming reaction within 10.sup.-2 to 10.sup.-4 seconds.

REFERENCES:
patent: 2617714 (1952-11-01), Arnold
patent: 3009783 (1961-11-01), Sheer et al.
patent: 3331664 (1967-07-01), Jordan
patent: 3409403 (1968-11-01), Bjornson et al.
patent: 3431074 (1969-03-01), Jordan
patent: 3832450 (1974-08-01), Wiggins

Affiliated with

Also associated with

Rating

Process for production of carbon black does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for production of carbon black, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for production of carbon black will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-339819