Process for producing thin films of oxide ceramic

Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

42725532, 42725528, 4271263, 427576, 427595, C23C 1640, B05D 306

Patent

active

060370025

ABSTRACT:
A process for producing thin films of oxide ceramic by deposition of metal oxides on a surface. An accelerator is added to initiate oxidation of organometallic precursors.

REFERENCES:
patent: 5164363 (1992-11-01), Eguchi et al.
patent: 5254530 (1993-10-01), Sugimoto et al.
patent: 5478610 (1995-12-01), Desu et al.
patent: 5637351 (1997-06-01), O'Neal et al.
patent: 5686151 (1997-11-01), Imai et al.
International Application WO 93/13243 (Buchanan et al.), dated Jul. 8, 1993.
Japanese Patent Abstract No. 06166597 (Takuo), dated Jun. 14, 1994.
Japanese Patent No 7-273216, dated Oct. 20, 1995.
Takuma Katayama et al.: "Photo-MOCVD of PbTiO3 thin films", Journal of Crystal Growth, 115(1991) Dec. pp. 289-293.
Weyten et al, Physica C 270, pp. 207-215, 1996.
International Publication No. WO 96/08587 (Kirlin et al.), dated Mar. 21, 1996.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for producing thin films of oxide ceramic does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for producing thin films of oxide ceramic, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for producing thin films of oxide ceramic will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-166836

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.