Liquid purification or separation – Processes – Ion exchange or selective sorption
Patent
1995-09-26
1998-05-12
Chu, John S.
Liquid purification or separation
Processes
Ion exchange or selective sorption
210683, 210685, 430331, B01D 1504
Patent
active
057500312
ABSTRACT:
The present invention provides a process for producing a developer containing a surfactant which contains a very low level of metal ions.
REFERENCES:
patent: 2929808 (1960-04-01), Ross et al.
patent: 4033909 (1977-07-01), Papa
patent: 4033910 (1977-07-01), Papa
patent: 4195138 (1980-03-01), Ward
patent: 4250031 (1981-02-01), Uejima et al.
patent: 4452883 (1984-06-01), Frenchik et al.
patent: 4567130 (1986-01-01), Held
patent: 4584261 (1986-04-01), Held
patent: 4636540 (1987-01-01), Warfel
patent: 4721665 (1988-01-01), Dooley et al.
patent: 4747954 (1988-05-01), Vaughn et al.
patent: 4784937 (1988-11-01), Tanaka et al.
patent: 4833067 (1989-05-01), Tanaka et al.
patent: 4914006 (1990-04-01), Kato et al.
patent: 5073622 (1991-12-01), Wojtech et al.
patent: 5116715 (1992-05-01), Roland
patent: 5118787 (1992-06-01), Furuno
patent: 5175078 (1992-12-01), Aoyama et al.
patent: 5212044 (1993-05-01), Liang et al.
patent: 5230988 (1993-07-01), Akiyama et al.
patent: 5284930 (1994-02-01), Matsumoto et al.
patent: 5286606 (1994-02-01), Rahman et al.
patent: 5300628 (1994-04-01), Honda
patent: 5350714 (1994-09-01), Trefonas, III et al.
patent: 5378802 (1995-01-01), Honda
patent: 5446125 (1995-08-01), Honda et al.
patent: 5472616 (1995-12-01), Szmanda et al.
patent: 5476750 (1995-12-01), Rahman et al.
patent: 5500127 (1996-03-01), Carey et al.
patent: 5516886 (1996-05-01), Rahman et al.
patent: 5521052 (1996-05-01), Rahman et al.
patent: 5543263 (1996-08-01), Rahman et al.
Rohm and HAAS Company; "Amberlite Ion Exchange Resins Laboratory Guide"; Sep. 1979; Philadelphia, PA.
JP-A-1190713 Inatomi, Shigeki et al, Jul. 31, 1989; Chemcial Abstracts, vol. 112, No. 18, Apr. 30, 1990, Columbus, OH, p. 17, the Abstract 159201u.
G. Noti et al, "Deionized Water Plants for Semiconductor Device Fabrication", Proceedings of the Inst:Radio and Electron. Eng, Aust.(Australia), vol. 34, No. 2, Mar. 1973, pp. 45-51.
Derwent Publications Ltd., London, GB; JP-A-05 234 876 (OCG Microelectronic Materials), Sep. 10, 1993.
Kimura et al; "Purification of Formaldehyde"; Mar. 9, 1977; CA87(7):52776y.
T. Tanada; "A New Photolithography Tech. with Antireflective . . . "; Journal of the Electrochemical Society, vol. 137, No. 12, pp. 393900-393905; Dec. 1990, Manchester, New Hampshire.
Bayard; "Water Free of Heavy Metals for Medical Use and Ion Exchange Resin Used in its Preparation" Nov. 16, 1992; CA98(26):221589z.
Hirai et al. "Treatment of Waste Waters Containing Formaldehyde and Metals with Chelating Ion Exchange Resins"; Nov. 5, 1975; CA84(14):95328j.
Aubin Daniel P.
Rahman M. Dalil
Chu John S.
Clariant Finance (BVI) Limited
Sayko Jr. Andrew F.
LandOfFree
Process for producing surfactant having a low metal ion level an does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for producing surfactant having a low metal ion level an, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for producing surfactant having a low metal ion level an will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-976381