Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2009-07-27
2010-10-05
Lindsay, Jr., Walter L (Department: 2812)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C438S031000, C438S032000, C372S046013, C372S045011, C257SE33067, C257SE21002
Reexamination Certificate
active
07807485
ABSTRACT:
Provided is a process for producing a surface emitting laser including a surface relief structure provided on laminated semiconductor layers, including the steps of transferring, to a first dielectric film, a first pattern for defining a mesa structure and a second pattern for defining the surface relief structure in the same process; and forming a second dielectric film on the first dielectric film and a surface of the laminated semiconductor layers to which the first pattern and the second pattern have been transferred. Accordingly, a center position of the surface relief structure can be aligned with a center position of a current confinement structure at high precision.
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Ikuta Mitsuhiro
Takeuchi Tetsuya
Uchida Tatsuro
Canon Kabushiki Kaisha
Fitzpatrick ,Cella, Harper & Scinto
Lindsay, Jr. Walter L
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