Process for producing superconducting thin films

Details Process for producing superconducting thin films Process for producing superconducting thin films

1988-03-25

1990-04-24

Morgenstern, Norman

Superconductor technology: apparatus, material, process

High temperature , per se

Having tc greater than or equal to 150 k

20419224, 20419211, 20429836, 427 62, 427 38, 505731, 505730, C23C 1446, B05D 512

Patent

active

049200941

ABSTRACT:
A process for producing a superconducting thin film on a surface of a substrate of the present invention comprises the steps of: sputttering a target made of a group IIIa metal and/or an oxide thereof, a group IIa metal and/or an oxide thereof and copper and/or an oxide theref with an ion beam or a neutral beam to allow the sputtered particles from the target to be deposited on the substrate; and impinging an oxygen neutral beam on the substrate.

REFERENCES:
patent: 4404263 (1983-09-01), Hodes et al.
patent: 4430190 (1984-02-01), Eilers et al.
patent: 4468313 (1984-08-01), Okumura et al.
patent: 4793908 (1988-12-01), Scott et al.
Kawasaki et al., "Compositional and Structural Analyses for Optimizing the Preparation Conditions of Superconducting (La.sub.1-x Sr.sub.x).sub.y Cu O.sub.4-8 Films by Sputtering", Jpn. J. Appl. Phys., vol. 26, No. 4, Apr., 1987, pp. L388-390.
Erler et al., "Nitride Film Deposition by Reactive Ion Beam Sputtering", Thin Solid Films 65(1980), 233-245.
Harper, "Ion Beam Deposition", Thin Film Processes edited by Vossen et al, Academic Press 1978, pp. 175-198.
Wu et al, "Superconductivity at 93K in a New Mixed-Phase Y--Ba--Cu--O Compound System at Ambient Pressure", Phys. Rev. Lett. 58(9), Mar. 1987, pp. 908-910.

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