Process for producing structures in resist layers using ultrason

Details Process for producing structures in resist layers using ultrason Process for producing structures in resist layers using ultrason

1985-05-13

1986-09-16

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Use of sound or nondigital compressive force

430322, 430328, G03F 700, G03F 702, G03F 726

Patent

active

046122672

ABSTRACT:
A process for the production of structures by the polymerization, or fragmentation of resist layers comprising the steps of effecting an incomplete exposure of the resist layer corresponding to the pattern of the structures, and of fully developing the structure in the resist layer by ultrasonic irradiation.
An acoustic microscope is preferably used for the ultrasonic irradiation, whereby the formation of the structure in the resist layer may also be observed.

REFERENCES:
patent: 3661660 (1972-05-01), Wessells et al.
patent: 4225658 (1980-09-01), Maskasky
patent: 4243744 (1981-01-01), Lockwood et al.
patent: 4447510 (1984-05-01), Frass et al.
patent: 4521092 (1985-06-01), Ferrante

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