Chemistry of inorganic compounds – Treating mixture to obtain metal containing compound – Group viib metal
Patent
1994-01-12
1995-03-28
Bos, Steven
Chemistry of inorganic compounds
Treating mixture to obtain metal containing compound
Group viib metal
423 51, 423605, C01G 4502
Patent
active
054014778
ABSTRACT:
A process for producing manganese dioxide comprising the steps of:
(1) reacting manganese oxide with a molar excess of an aqueous chloric acid solution in a reaction zone to form a reaction mixture in said zone comprising chlorine gas, a solid phase containing manganese dioxide, and a liquid phase containing chloric acid and water; the concentration of chloric acid in said liquid phase is greater than about 5% by weight of said liquid phase upon leaving the reaction zone;
(2) separating said chlorine gas from said solid phase and said liquid phase;
(3) separating said solid phase containing manganese dioxide from liquid phase containing chloric acid and water;
(4) removing water from said separated liquid phase to concentrate said chloric acid in said separated liquid phase; and
(5) returning said separated and concentrated liquid phase back to said reaction zone for further reaction with manganese oxide.
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Kauffman, J. W. et al., "Particulate manganese dioxide . . . manufacture", Faming Zhaanli Shenging Gongkai Shuomingshu, 49-3, Feb. 1987, pp. 1-12.
Cawlfield David W.
Ward Leslie R.
Bos Steven
Olin Corporation
Simons William A.
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