Process for producing single crystal of compound...

Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from liquid or supercritical state

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C117S217000, C117S218000, C117S222000

Reexamination Certificate

active

06989059

ABSTRACT:
In a production method for producing a compound semiconductor single crystal by LEC method using a crystal growth apparatus with a double crucible structure, it was made to grow up a crystal by covering the second crucible with a plate-like member having a pass-through slot for being capable of introducing a crystal pulling-up shaft having a seed crystal holding part at a tip into the second crucible and creating a state where an atmosphere within the second crucible scarcely changes (a semi-sealed structure).

REFERENCES:
patent: 5047112 (1991-09-01), Ciszek
patent: 5840115 (1998-11-01), Taguchi et al.
patent: 6447602 (2002-09-01), Beswick
patent: 2005/0118739 (2005-06-01), Asashi et al.
patent: 60-118699 (1985-06-01), None
patent: 62-59598 (1987-03-01), None
patent: 6-271395 (1994-09-01), None
patent: 2004-099333 (2004-04-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for producing single crystal of compound... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for producing single crystal of compound..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for producing single crystal of compound... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3571205

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.