Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes joining independent crystals
Patent
1994-10-13
1995-12-12
Breneman, R. Bruce
Single-crystal, oriented-crystal, and epitaxy growth processes;
Processes joining independent crystals
117 28, C30B 1534
Patent
active
054740193
ABSTRACT:
A process and apparatus for producing silicon single crystals with excellent dielectric strength of gate oxide films by adjusting the temperature gradient of the pulled-up silicon single crystal without loss of its rate of pulling. The process of producing silicon single crystals by pulling up the single crystal from a melt of material of the single crystal imposes a certain average temperature gradient on the grown single crystal while it is still at high temperature. The apparatus is provided with a heating element outside a crucible and pulling shaft with which a single crystal is pulled up from the melt of the material in the crucible. The ratio of length h of the heating element to the inside diameter .phi. of the crucible is adjusted so as to be between 0.2 and 0.8 whereby the temperature gradient can be maintained below 2.5.degree. C./mm.
REFERENCES:
patent: 5248378 (1993-09-01), Oda et al.
Japanese Extended Abstracts (The 38th Spring Meeting, 1991); No. 1, The Japan Society of Applied Physics and Related Societies (Mar. 28-31, 1991), "Studies on Crystal Growing Conditions Concerning with Vox Failure," K. Kitagawa et al.
Japanese Extended Abstracts (The 39th Spring Meeting, 1992); The Japan Society of Applied Physics and Related Societies (Mar. 28-31, 1992), "Influence of Thermal History in CZ Crystal Growth Process on Dielectric Strength of Gate Oxide Films," Y. Komatsu et al.
Akashi Yoshihiro
Ito Makoto
Kuramochi Kaoru
Okamoto Setsuo
Tsujimoto Yasuji
Breneman R. Bruce
Garrett Felisa
Sumitomo Sitix Corporation
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