Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1988-07-01
1990-05-29
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430175, 430177, 430302, G03C 174, G03C 160
Patent
active
049295330
ABSTRACT:
A process is described for producing a presensitized lithographic printing plate by coating onto a surface-roughened aluminum plate a solution having dissolved in a solvent containing at least 10 wt % 1-methoxy-2-propanol a negative-working, light-sensitive composition which contains a light-sensitive diazo resin and a high-molecular weight compound and which is developable with an aqueous alkali developer, and drying the coated solution.
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J. Kosar, Light-Sensitive Systems, Wiley & Sons, 1965, pp. 158-160, 175-180 and 321-330.
Deller's Patent Claims, Second Edition, Section 482 "Interpretation of Consisting Essentially Of", Cumulative Supplement, vol. 3, Issue 1, Aug., 1987.
Anon, "Spotlight on Glycol Ethers", Chemical Week, Jun. 9, 1986, p. 7.
Misu Hiroshi
Nishikawa Nobuo
Bowers Jr. Charles L.
Fuji Photo Film Co. , Ltd.
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