Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Effecting a change in a polymerization process in response...
Reexamination Certificate
2007-12-20
2011-10-04
Wu, David W (Department: 1762)
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Effecting a change in a polymerization process in response...
C526S072000
Reexamination Certificate
active
08030419
ABSTRACT:
To provide a method for producing a polymer for semiconductor lithography which can attain high uniformity in the polymer from lot to lot. The method for producing a polymer for semiconductor lithography includes the step (P) of heating a polymerizable monomer and a polymerization initiator in a solvent, to thereby polymerize the monomer, the step (P) having the step of controlling a polymerization pressure by regulating a liquid level in a container (WO) which is disposed between a polymerization tank and the atmospheric air and which provides liquid sealing.
REFERENCES:
patent: 4603101 (1986-07-01), Crivello
patent: 5550279 (1996-08-01), Yano et al.
patent: 6489432 (2002-12-01), Jung et al.
patent: 2001/0043992 (2001-11-01), Jung et al.
patent: 2004/0167298 (2004-08-01), Yamagishi et al.
patent: 2005/0287474 (2005-12-01), Yamagishi et al.
patent: 0 102 450 (1984-03-01), None
patent: 59-45439 (1984-03-01), None
patent: 60 164200 (1985-10-01), None
patent: 62-115440 (1987-05-01), None
patent: 5-113667 (1993-05-01), None
patent: 06 192182 (1994-07-01), None
patent: 9-73173 (1997-03-01), None
patent: 9-90637 (1997-04-01), None
patent: 10-26828 (1998-01-01), None
patent: 10-161313 (1998-06-01), None
patent: 10-207069 (1998-08-01), None
patent: 2000-26446 (2000-01-01), None
patent: 2000-313779 (2000-11-01), None
patent: 2001-27810 (2001-01-01), None
patent: 2001-192411 (2001-07-01), None
patent: 2001-226324 (2001-08-01), None
patent: 2001-242627 (2001-09-01), None
patent: 2003-57828 (2003-02-01), None
patent: 2004 269855 (2004-09-01), None
patent: 2006 176573 (2006-07-01), None
patent: 2006-193687 (2006-07-01), None
patent: 2006-243308 (2006-09-01), None
Iuchi Kensuke
Kato Ichiro
Magara Isao
Omori Hideki
Osaki Kouzo
Maruzen Petrochemical Co. Ltd.
Nguyen Vu A
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Wu David W
LandOfFree
Process for producing polymer for semiconductor lithography does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for producing polymer for semiconductor lithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for producing polymer for semiconductor lithography will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4288837