Process for producing plasma polymerized film

Details Process for producing plasma polymerized film Process for producing plasma polymerized film

1986-03-19

1987-09-15

Demers, Arthur P.

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

204168, 204169, 427424, C07C 324, C23B 1300

Patent

active

046937994

ABSTRACT:
A process for producing a plasma polymerized film, which comprises forming a plasma polymerized film on the surface of a substrate placed in a reaction zone by subjecting an organic compound containing gas to plasma polymerization utilizing low temperature plasma formed by pulse discharging, in which the time for non-discharge condition is at least 1 msec. and the voltage rise time for gas breakdown is not longer than 100 msec. The plasma polymerized film obtained has a small coefficient of friction, high lubricity, durability and heat resistance and is useful as a solid lubricating film, etc.

REFERENCES:
patent: 3471316 (1969-10-01), Manuel
Tkachuk et al., Polymer Science, USSR, vol. 16, No. 7, (1974), pp. 1860-1869.

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