Process for producing photosensitive negative working diazo resi

Details Process for producing photosensitive negative working diazo resi Process for producing photosensitive negative working diazo resi

1988-02-17

1990-04-17

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430175, 430177, 430302, G03C 174, G03F 716, G03F 708

Patent

active

049179888

ABSTRACT:
A process for producing a photosensitive lithographic plate comprises coating onto a substrate having a hydrophilic surface a solution of a negative working photosensitive composition containing a photosensitive diazo resin and a linear organic polymer dissolved in a solvent mixture comprising:

REFERENCES:
patent: 3890152 (1975-06-01), Ruckert et al.
patent: 4421841 (1983-12-01), Shimizu et al.
patent: 4552908 (1985-11-01), Nicks et al.
patent: 4657942 (1987-04-01), Iwasaki et al.
patent: 4659645 (1987-04-01), Frommeld et al.
patent: 4764450 (1988-08-01), Ruckert et al.

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