Process for producing patterns in dielectric layers formed by pl

Details Process for producing patterns in dielectric layers formed by pl Process for producing patterns in dielectric layers formed by pl

1988-05-18

1989-07-04

Morganstern, Norman

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 38, 427 431, B05D 306

Patent

active

048449458

ABSTRACT:
A process for forming a dielectric patterned layer of any desired geometry on a selected substrate which includes vapor depositing selected reactants on said substrate only in areas thereon which are coextensive with the surface area of an adjacent metal electrode pattern.

REFERENCES:
patent: 4550257 (1985-10-01), Binnig et al.
Bunshah et al., Deposition Technologies for Films & Coatings, (Noyes, Park Ridge, NJ.)/. 1982, pp. 365-384.

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