Process for producing oxide thin films and chemical vapor deposi

Details Process for producing oxide thin films and chemical vapor deposi Process for producing oxide thin films and chemical vapor deposi

1997-09-17

1999-03-02

Dang, Thi

Coating apparatus

Gas or vapor deposition

With treating means

118723R, C23C 1600

Patent

active

058765042

ABSTRACT:
The present invention relates to a process for producing crystallographic oriented oxide thin films having an NaCl-type structure, a spinel structure or a Wurtzite structure used as a buffer layer to obtain a functional oxide thin film such as a superconductive oxide thin film and a ferroelectric thin film, and a chemical vapor deposition apparatus used therefor. A rotatable substrate holder is provided in a reaction chamber. The substrate holder, which holds substrates thereunder, includes a substrate heater. The substrate holder is grounded to provide an electrode. Another electrode, which is connected to a high frequency power source, is located opposing the substrate holder in the reaction chamber. At a side wall of the reaction chamber, an exhaust is arranged. In a plasma electric discharge area formed between the substrate holder and the electrode, a material gas supplier is located, having a predetermined tilt angle .theta. with respect to the substrate holder.

REFERENCES:
patent: 4975324 (1990-12-01), Torii et.
patent: 4976996 (1990-12-01), Monkowski et al.
patent: 5017404 (1991-05-01), Paquet et al.
patent: 5110437 (1992-05-01), Yamada et al.
patent: 5162633 (1992-11-01), Sonobe et al.
patent: 5234502 (1993-08-01), Mochizuki et al.

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