Process for producing nonequiaxed silicon aluminum oxynitride

Details Process for producing nonequiaxed silicon aluminum oxynitride Process for producing nonequiaxed silicon aluminum oxynitride

1990-12-10

1992-04-28

Langel, Wayne

Compositions: ceramic

Ceramic compositions

Refractory

423327, C01B 3326, C04B 3558

Patent

active

051089670

ABSTRACT:
A .beta.'SiAlON produced from initial reactant materials comprising Al.sub.2 O.sub.3, and carbon that produces a .beta.'SiAlON material having a strength greater than about 50 ksi at approximately 1000.degree. C. In a preferred embodiment of the invention the .beta.'SiAlON material has a strength greater than about 50 ksi at approximately 1200.degree. C. In a second embodiment of the present invention is a low-cost process for producing unsintered high purity alpha silicon nitride structured SiAlON by carbothermic reaction from initial reactant materials comprising Al.sub.2 O.sub.3, SiO.sub.2 and carbon.

REFERENCES:
patent: 3837871 (1974-09-01), Weaver
patent: 3903230 (1975-09-01), Kamigaito et al.
patent: 3960581 (1976-06-01), Cutler
patent: 3991166 (1976-11-01), Jack et al.
patent: 4147759 (1979-04-01), Demit
patent: 4172108 (1979-10-01), Maeda
patent: 4499193 (1985-02-01), Phelps et al.
patent: 4511666 (1985-04-01), Phelps et al.
patent: 4680278 (1987-07-01), Inoue et al.
patent: 4731236 (1988-03-01), Murakawa et al.
patent: 4812298 (1989-03-01), Kohtoku et al.
patent: 4977113 (1990-12-01), Phelps et al.
"Review-Sialons and Related Nitrogen Ceramics", Journal of Materials Science, 11 (1976) 1135-1158.

Affiliated with

Also associated with

Rating

Process for producing nonequiaxed silicon aluminum oxynitride does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for producing nonequiaxed silicon aluminum oxynitride, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for producing nonequiaxed silicon aluminum oxynitride will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1249337