Process for producing material sensitive to electromagnetic and

Coating processes – Electrical product produced – Photoelectric

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427 76, 427 87, 427108, 427 6, 430297, 430299, 430323, 430495, 430524, 4273761, 4273766, 4273839, G03C 500

Patent

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042346258

ABSTRACT:
A process of producing a material sensitive to an electromagnetic and corpuscular radiation involves successively depositing, onto a transparent substrate, a layer of a semiconductor, a barrier layer inert to the semiconductor layer and a layer of a metal capable of reacting with the semiconductor layer under the effect of the electromagnetic and corpuscular radiation with the formation of the reaction products. After deposition of the metal layer, there is performed annealing at a temperature equal to or exceeding the temperature of diffusion of the material of the barrier layer into the material of the layers adjacent thereto. The annealing is conducted for a period sufficient for a partial or a complete dissolution of the barrier layer.

REFERENCES:
patent: 3239376 (1966-03-01), Schmidt
patent: 3253951 (1966-05-01), Marinaccio et al.
patent: 3637377 (1972-01-01), Hallman et al.
patent: 3637381 (1972-01-01), Hallman et al.

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