Etching a substrate: processes – Forming or treating thermal ink jet article
Patent
1996-12-20
2000-09-26
Lund, Jeffrie R
Etching a substrate: processes
Forming or treating thermal ink jet article
438 21, G11B 5127, G01D 1500, G01D 1516
Patent
active
061238635
ABSTRACT:
A process for producing a liquid-jet recording head comprises the steps of providing a solid layer of a photosensitive material in a pattern of a liquid path on a substrate, providing at least a portion of a liquid path forming material on the substrate having the solid layer, and removing the solid layer from the substrate, wherein the solid layer is removed by use of at least one of methyl lactate, ethyl lactate, and butyl lactate, or a solvent which contains as a main component at least one of methyl lactate, ethyl lactate, and butyl lactate.
REFERENCES:
patent: 4313124 (1982-01-01), Hara
patent: 4345262 (1982-08-01), Shirato et al.
patent: 4459600 (1984-07-01), Sato et al.
patent: 4463359 (1984-07-01), Ayata et al.
patent: 4558333 (1985-12-01), Sugitani et al.
patent: 4608577 (1986-08-01), Hori
patent: 4657631 (1987-04-01), Noguchi
patent: 4723129 (1988-02-01), Endo et al.
patent: 4740796 (1988-04-01), Endo et al.
patent: 5436650 (1995-07-01), Kobayashi et al.
Weast, Ph. D., Robert C. "CRC Handbook of Chemistry and Physics, 58th Edition", p. C-456, Jan. 1977.
Imamura Isao
Shiba Shoji
Shimomura Akihiko
Canon Kabushiki Kaisha
Lund Jeffrie R
Powell Alva C
LandOfFree
Process for producing liquid-jet recording head, liquid-jet reco does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for producing liquid-jet recording head, liquid-jet reco, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for producing liquid-jet recording head, liquid-jet reco will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2097057