Process for producing liquid crystal devices

Stock material or miscellaneous articles – Liquid crystal optical display having layer of specified... – With charge transferring layer of specified composition

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

1562731, 1562753, 156292, 350334, 427 13, 427 141, C09K 1900

Patent

active

049257080

ABSTRACT:
A method of making a liquid crystal device comprises producing, for example by means of electrostatic spraying, ligaments of a curable liquid which are deposited as such or as droplets (as a result of breaking up of the ligaments) on a sheet which is to form one boundary wall of the device. Curing of the liquid may be initiated while the liquid is in flight and completed after deposition. Liquid crystal material is applied to the deposited ligaments or droplets and a second sheet is laminated with the first sheet to encapsulate the liquid crystal material. The deposited ligaments or droplets serve to space the sheets apart and/or provide surfaces with which, in the field-off condition, the liquid crystal molecules can align in directions different to the direction of alignment induced by application of an electric or magnetic field.

REFERENCES:
patent: 4411495 (1983-10-01), Beni et al.
patent: 4526818 (1985-07-01), Hoshikawa et al.
Derwent Abstract for German specification No. 3543204 (Jun. 1987).
Derwent Abstract for Japanese specification No. 58100122 (Jun. 1983).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for producing liquid crystal devices does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for producing liquid crystal devices, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for producing liquid crystal devices will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-620824

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.