Chemistry of inorganic compounds – Phosphorus or compound thereof – Halogen containing
Patent
1980-02-14
1981-09-29
Vertiz, O. R.
Chemistry of inorganic compounds
Phosphorus or compound thereof
Halogen containing
423319, 423483, 423485, 423467, C01B 2510, C01B 2516
Patent
active
042922895
ABSTRACT:
An improved method for producing hydrogen fluoride from fluoride bearing ores, such as fluorospar and fluorapatite, by reaction of the ore as a slurry in fluorosulfonic acid. The slurry is heated by the exothermic heat of the reaction to vaporize volatile phosphorous compounds and substantial quantities of hydrogen fluoride. The calcium fluoride is substantially reacted to form hydrogen fluoride. High silica fluorospar ores can be used since silicon tetrafluoride is not formed with fluorosulfonic acid. Another feature provides for addition of calcium fluoride to the slurry to react with the by-product sulfuric acid in the residual solids to eliminate the sulfuric acid recovery step in the process. Hydrogen fluoride produced is recovered, together with the hydrogen fluoride produced from the hydrolysis or pyrolysis of the intermediate fluorophosphorous compounds. Additionally, at least a portion of the hydrogen fluoride can be reacted with sulfur trioxide to form fluorosulfonic acid for makeup in the process.
REFERENCES:
patent: 3428422 (1969-02-01), Wiesboeck
patent: 3429659 (1969-02-01), Wiesboeck
patent: 3584499 (1971-06-01), Wiesboeck
patent: 3634034 (1972-01-01), Nickerson et al.
Cannon Curtis W.
Hall Robert N.
Climax Chemical Company
Heller Gregory A.
Vertiz O. R.
LandOfFree
Process for producing hydrogen fluoride and phosphoric acid does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for producing hydrogen fluoride and phosphoric acid, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for producing hydrogen fluoride and phosphoric acid will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1233796